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Characteristics of toxic gases and VOC gases in chemical plants

Aug 19, 2023

Characteristics of toxic gases and VOC gases in chemical plants

 

Common odorous substances and VOCs in the treatment of chemical waste gas include:


Sulfide is mainly hydrogen sulfide, with a rotten egg odor and a foul odor threshold of 0.00041ppm;


Dimethyl sulfur has a seafood like special odor, with a foul odor threshold of 0.003ppm;


Sulfur dichloride medical bandages have a foul and irritating odor, with a foul odor threshold of 0.001 ppm;


Methylthiol shoe polish has a foul and irritating odor, with a foul odor threshold of 0.00007ppm.


VOCs exhaust gases include:

Amines are mainly trimethylamine - irritating odor, with a odor threshold of 0.000032ppm; Triethylamine - has a strong ammonia odor, with a odor threshold of 0.0054ppm


Benzene series compounds are mainly styrene - pungent odor, with a foul odor threshold of 0.035ppm; Paracresol Pharmaceutical Odor, Odor Threshold 0.001ppm


Esters mainly consist of ethyl acrylate - dry wheat straw sample with a pungent odor, with a foul odor threshold of 0.00047ppm

Toxic and odorous gases and VOCs emissions from chemical industries pose a threat to people's health due to the foul odor

Harmful to human health

Induced photochemical smoke

Generate secondary organic aerosols

PM2.5 precursor


Problems in the treatment of chemical VOCs waste gas and toxic odorous gases:


Unorganized emission is severe, and effective waste gas collection measures are the key link in governance;


The composition is complex, and the broad-spectrum requirements for purification technology are high. However, the existing treatment technology has low level, poor effectiveness, and high cost, which seriously cannot meet the urgent needs of governance;


Focusing on the design and non manufacturing of end treatment facilities, there is a serious lack of source control technology;


A single technology can only cure headaches and foot pain, lacking a comprehensive solution, low technology integration, and no complete processing system;

 

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